358
63
Physical review B
V. Janiš, V. Pokorný, Š. Kos
Failure of the Baym-Kadanoff construction to consistently match quantum dynamics with thermodynamic critical behavior, Phys. Rev. B 109 (2024) 075171.
Surface and Coatings Technology
K. Shaji, S. Haviar, P. Zeman, Š. Kos, R. Čerstvý, J. Čapek
Controlled sputter deposition of oxide nanoparticles-based composite thin films, Surf. Coat. Technol. 477 (2024) 130325.
Materials & Design
J.C. Jiang, Y. Shen, P. Zeman, M. Procházka, J. Vlček, E.I. Meletis
Effects of Y and Ho doping on microstructure evolution during oxidation of extraordinary stable Hf–B–Si–Y/Ho–C–N films up to 1500 °C , Mater. Des. 237 (2024) 112589.
Surface and Coatings Technology
J. Musil, Š. Kos, P. Baroch
Flexible hard nanocoatings with high thermal stability, Surf. Coat. Technol. 476 (2024) 130195.
Journal of Vacuum Science & Technology A
M. Farahani, T. Kozák, A.D. Pajdarová, A. Bahr, H. Riedl, P. Zeman
Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target, J. Vac. Sci. Technol. A. 41 (2023) 063008.
Solar Energy Materials and Solar Cells
M. Kaufman, J. Vlček, J. Houška, R. Čerstvý, S. Farrukh, M. Chargaoui, S. Haviar, J. Jiang, E.I. Meletis, Š. Kos
High-performance thermochromic YSZ/V0.986W0.014O2/YSZ coatings for energy-saving smart windows, Sol. Energy Mater. Sol. Cells 263 (2023) 112570.
Journal of Physics D: Applied Physics
J. Vlček, M. Kaufman, A.D. Pajdarová, S. Haviar, R. Čerstvý, J. Houška, M. Farahani
Detailed pathway for a fast low-temperature synthesis of strongly thermochromic W-doped VO2 films with a low transition temperature, J. Phys. D: Appl. Phys. 56 (2023) 505301
Computational Materials Science
M. Matas, J. Houška
Magnetic ground state of holmium nitride, Comput. Mater. Sci. 230 (2023) 112537.
Physics of Plasmas
P. Hadjisolomou, T.M. Jeong, D. Kolenatý, A. J. Macleod, V. Olšovcová, R. Versaci, C.P. Ridgers, S.V. Bulanov
Gamma-flash generation in multi-petawatt laser–matter interactions, Phys. Plasmas 30 (2023) 093103.
Applied Surface Science
P. Čurda, D. Kaftan, T. Kozák, S. Kumar, P. Sezemský, V. Straňák
High-defined and size-selective deposition of nanoparticles by their manipulation in an electrostatic field, Appl. Surf. Sci. 640 (2023) 158307.
Applied Surface Science
P. Pleskunov, T. Košutová, M. Protsak, M. Tosca, K. Biliak, D. Nikitin, Z. Krtouš, J. Hanuš, J. Houška, M. Cieslar, S. Ali-Ogly, P. Kuš, O. Kylián, A. Choukourov
A multi-timescale model predicts the spherical-to-cubic morphology crossover of magnetron-sputtered niobium nanoparticles, Appl. Surf. Sci. 639 (2023) 158235.
Applied Surface Science
J. Rezek, T. Kozák, M. Farahani, J. Houška
On the surface biasing effectiveness during reactive high-power impulse magnetron sputter deposition of zirconium dioxide, Appl. Surf. Sci. 638 (2023) 158131.
Thin Solid Films
P. Novák, L. Nedvědová, T. Kozák, P. Šotová, O. Bláhová, Z. Jansa, R. Medlín, M. Frank Netrvalová, J. Minár
Investigation of carrier transport in ZnO and ZnO:Al thin films sputtered at different oxygen conditions, Thin Solid Films 780 (2023) 139942.
Plasma Sources Science Technology
T. Kozák
Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction, Plasma Sources Sci. Technol. 32 (2023) 035007.
Materials Chemistry and Physics
A. Hanková, T. Košutová, J. Hanuš, A. Kuzminova, P. Pleskunov, M. Červená, P. Zeman, N. Khomiakova, F. Hájek, O. Kylián
Morphological and structural evolution of gas-phase synthesized vanadium nanoparticle films induced by thermal treatment, Mater. Chem. Phys. 301 (2023) 127587.
Computational Materials Science
J. Houska, P. Zeman
Role of Al in Cu–Zr–Al thin film metallic glasses: Molecular dynamics and experimental study, Comput. Mater. Sci. 222 (2023) 112104.
Ceramics International
A. Farhadizadeh, J. Vlček, J. Houška, S. Haviar, R. Čerstvý, M. Červená, P. Zeman, M. Matas
Effect of nitrogen content on high-temperature stability of hard and optically transparent amorphous Hf–Y–Si–B–C–N coatings, Ceram. Int. 49 (2023) 6086–6093.
Journal of Applied Physics
K. Hantová, J. Houška
Molecular dynamics study of the growth of ZnOx films J. Appl. Phys., 132 (2022) 185304.
Physical Review Research
D. Kolenatý, P. Hadjisolomou, R. Versaci, T. M. Jeong, P. Valenta, V. Olšovcová, S. V. Bulanov
Electron-positron pairs and radioactive nuclei production by irradiation of high-Z target with γ-photon flash generated by an ultra-intense laser in the λ3 regime, Phys. Rev. Research 4 (2022) 023124.
Journal of Alloys and Compounds
M. Červená, J. Houška, R. Čerstvý, P. Zeman
On thermal stability and oxidation behavior of metastable W–Zr thin-film alloys, J. Alloy. Compd. 925 (2022) 166599.
Surface and Coatings Technology
J. Rezek, J. Szelwicka, J. Vlček, R. Čerstvý, J. Houška, M. Fahland, J. Fahlteich
Transfer of the sputter technique for deposition of strongly thermochromic VO2-based coatings on ultrathin flexible glass to large-scale roll-to-roll device, Surf. Coat. Technol. 442 (2022) 128273.
Plasma Sources Science Technology
A.D. Pajdarová, T. Kozák, J. Čapek, T. Tölg
On density distribution of Ti atom and ion ground states near the target in HiPIMS discharge using cavity ring-down spectroscopy and laser induced fluorescence, Plasma Sources Sci. Technol. 31 (2022) 05LT04.
Journal of Applied Physics
J. Houška
Design and reactive magnetron sputtering of thermochromic coatings, J. Appl. Phys. 131 (2022) 110901.
Vacuum
A. Farhadizadeh, T. Kozák
The importance of discharge voltage in DC magnetron sputtering for energy of sputtered and backscattered atoms on the substrate: Monte-Carlo simulations, Vacuum 196 (2022) 110716.
Journal of Physics: Condensed Matter
M. Matas, A. Farhadizadeh, J. Houška
Vacancies and substitutional defects in multicomponent diboride Ti0.25Zr0.25Hf0.25Ta0.25B2: first-principle study, J. Phys.: Condens. Matter 34 (2022) 095901.
Ceramics International
A. Farhadizadeh, J. Vlček, J. Houška, S. Haviar, R. Čerstvý, M. Červená
Hard and electrically conductive multicomponent diboride-based films with high thermal stability, Ceram. Int. 48 (2022) 540–547.
Applied Surface Science
J. Houška, J. Rezek, R. Čerstvý
Dependence of the ZrO2 growth on the crystal orientation: growth simulations and magnetron sputtering, Appl. Surf. Sci. 572 (2022) 151422.
Nanomaterials
N. Kumar, S. Haviar, P. Zeman
Three-Layer PdO/CuWO4/CuO System for Hydrogen Gas Sensing with Reduced Humidity Interference, Nanomaterials 11 (2021) 3456.
Materials
J. Houska
Maximum Achievable N Content in Atom-by-Atom Growth of Amorphous Si–B–C–N Materials, Materials 14 (2021) 5744.
Surface and Coatings Technology
J.C. Jiang, T. Bárta, J. Vlček, J. Houška, E.I. Meletis
Microstructure of high-performance thermochromic ZrO2/V0.984W0.016O2/ZrO2 coating with a low transition temperature (22 °C) prepared on flexible glass, Surf. Coat. Technol. 424 (2021) 127654.
Surface and Coatings Technology
L. Zauner, A. Bahr, T. Kozák, J. Čapek, T. Wojcik, O. Hunold, S. Kolozsvári, P. Zeman, P.H. Mayrhofer, H. Riedl
Time-averaged and time-resolved ion fluxes related to reactive HiPIMS deposition of Ti–Al–N films, Surf. Coat. Technol. 424 (2021) 127638.
Journal of Alloys and Compounds
M. Červená, R. Čerstvý, T. Dvořák, J. Rezek, P. Zeman
Metastable structures in magnetron sputtered W–Zr thin-film alloys, J. Alloy. Compd. 888 (2021) 161558.
Surface and Coatings Technology
S. Kagerer, L. Zauner, T. Wojcik, S. Kolozsvári, T. Kozák, J. Čapek, P. Zeman, H. Riedl, P.H. Mayrhofer
Reactive HiPIMS deposition of Al-oxide thin films using W-alloyed Al targets, Surf. Coat. Technol. 422 (2021) 127467.
Surface and Coatings Technology
R. Hahn, A. Tymoszuk, T. Wojcik, A. Kirnbauer, T. Kozák, J. Čapek, M. Sauer, A. Foelske, O. Hunold, P. Polcik, P.H. Mayrhofer, H. Riedl
Phase formation and mechanical properties of reactively and non-reactively sputtered Ti–B–N hard coatings, Surf. Coat. Technol. 420 (2021) 127327.
Vacuum
P. Mareš, M. Dubau, J. Polášek, T. Mates, T. Kozák, J. Vyskočil
High deposition rate films prepared by reactive HiPIMS, Vacuum 191 (2021) 110329.
Solar Energy Materials and Solar Cells
J. Houška
Toward colorless smart windows, Sol. Energy Mater. Sol. Cells 230 (2021) 111210.
Surface and Coatings Technology
Š. Batková, T. Kozák, S. Haviar, P. Mareš, J. Čapek
Effect of exit-orifice diameter on Cu nanoparticles produced by gas-aggregation source, Surf. Coat. Technol. 417 (2021) 127196.
Vacuum
J. Musil, Z. Čiperová, R. Čerstvý, Š. Kos
Hard alloy films with enhanced resistance to cracking, Vacuum 188 (2021) 110186.
Vacuum
P. Zeman, S. Haviar, M. Červená
Self-formation of dual glassy-crystalline structure in magnetron sputtered W–Zr films, Vacuum 187 (2021) 110099.
Journal of Physics D: Applied Physics
J. Rezek, T. Kozák, N. Kumar, S. Haviar
Synergy of experiment and model for reactive HiPIMS: effect of discharge parameters on WOx composition and deposition rate, J. Phys. D:Appl. Phys. 54 (2021) 125202.
Acta Materialia
M. Matas, M. Procházka, J. Vlček, J. Houška
Dependence of characteristics of Hf(M)SiBCN (M = Y, Ho, Ta, Mo) thin films on the M choice: Ab-initio and experimental study, Acta Mater. 206 (2021) 116628.
Journal of Non-Crystalline Solids
M. Kotrlová, P. Zeman, J. Houška, V. Šímová, M. Procházka, R. Čerstvý, S. Haviar, J. Vlček
Enhancement of high-temperature oxidation resistance and thermal stability of hard and optically transparent Hf–B–Si–C–N films by Y or Ho addition, J. Non-Cryst. Solids. 553 (2021) 120470.
Thin Solid Films
M. Procházka, J. Vlček, J. Houška, S. Haviar, R. Čerstvý, K. Veltruská
Multifunctional MoOx and MoOxNy films with 2.5 < x < 3.0 and y < 0.2 prepared using controlled reactive deep oscillation magnetron sputtering, Thin Solid Films 717 (2021) 138442.
Coatings
T. Bárta, J. Vlček, J. Houška, S. Haviar, R. Čerstvý, J. Szelwicka, M. Fahland, J. Fahlteich
Pulsed Magnetron Sputtering of Strongly Thermochromic VO2-Based Coatings with a Transition Temperature of 22 °C onto Ultrathin Flexible Glass, Coatings 10 (2020) 1258.
Coatings
Y. Shen, J. Jiang, P. Zeman, M. Kotrlová, V. Šímová, J. Vlček, E.I. Meletis
Microstructure of High Temperature Oxidation Resistant Hf6B10Si31C2N50 and Hf7B10Si32C2N44 Films, Coatings 10 (2020) 1170.
Materials
N. Kumar, S. Haviar, J. Rezek, P. Baroch, P. Zeman
Tuning Stoichiometry and Structure of Pd-WO3-x Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering, Materials 13 (2020) 5101.
ACS Applied Materials & Interfaces
J. Houška
Maximum Achievable N Content in Atom-by-Atom Growth of Amorphous Si−C−N, ACS Appl. Mater. Interfaces 12 (2020) 41666-41673.
Plasma Sources Science Technology
A.D. Pajdarová, T. Kozák, Z. Hubička, M. Čada, P. Mareš, J. Čapek
Plasma parameters in positive voltage pulses of bipolar HiPIMS discharge determined by Langmuir probe with a sub-microsecond time resolution, Plasma Sources Sci. Technol. 29 (2020) 085016.
Surface and Coatings Technology
S. Haviar, T. Kozák, M. Meindlhumer, M. Zítek, K. Opatová, L. Kučerová, J. Keckes, P. Zeman
Nanoindentation and microbending analyses of glassy and crystalline Zr(–Hf)–Cu thin-film alloys, Surf. Coat. Technol. 399 (2020) 126139.
Scientific Reports
D. Kolenatý, J. Vlček, T. Bárta, J. Rezek, J. Houška, S. Haviar
High‑performance thermochromic VO2‑based coatings with a low transition temperature deposited on glass by a scalable technique, Sci. Rep. 10 (2020) 11107.
International journal of hydrogen energy
N. Kumar, J. Čapek, S. Haviar
Nanostructured CuWO4/WO3-x films prepared by reactive magnetron sputtering for hydrogen sensing, Int. J. Hydrog. Energy 45 (2020) 18066-18074.
Plasma Sources Science Technology
T. Kozák, A.D. Pajdarová, M. Čada, Z. Hubička, P. Mareš, J. Čapek
Ion energy distributions at substrate in bipolar HiPIMS: effect of positive pulse delay, length and amplitude, Plasma Sources Sci. Technol. 29 (2020) 065003.
Journal of Vacuum Science & Technology A
J. Čapek, Š. Batková, M. Matas, Š. Kos, T. Kozák, S. Haviar, J. Houška, J. Schusser, J. Minár, F. Dvořák, and P. Zeman
Bixbyite-Ta2N2O film prepared by HiPIMS and postdeposition annealing: Structure and properties, J. Vac. Sci. Technol. A. 38 (2020) 033409.
Surface and Coatings Technology
Š. Batková, J. Čapek, J. Rezek, R. Čerstvý, P. Zeman
Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films, Surf. Coat. Technol. 393 (2020) 125773.
Surface and Coatings Technology
A. Belosludtsev, J. Vlček, J. Houška, S. Haviar, R. Čerstvý
Tunable composition and properties of Al−O−N films prepared by reactive deep oscillation magnetron sputtering, Surf. Coat. Technol. 392 (2020) 125716.
Surface and Coatings Technology
J. Houška, T. Kozák
Distribution of O atoms on partially oxidized metal targets, and the consequences for reactive sputtering of individual metal oxides, Surf. Coat. Technol. 392 (2020) 125685.
Surface and Coatings Technology
P. Zeman, Š. Zuzjaková, R. Čerstvý, J. Houška, Y. Shen, J. Todt, J. Jiang, R. Daniel, J. Keckes, E.I. Meletis, J. Vlček
Extraordinary high-temperature behavior of electrically conductive Hf7B23Si22C6N40 ceramic film, Surf. Coat. Technol. 391 (2020) 125686.
Progress in Organic Coatings
A. Choukourov, I. Melnichuk, I. Gordeev, D. Nikitin, R. Tafiichuk, P. Pleskunov, J. Hanuš, J. Houška, T. Kretková, M. Dopita
Self-organization of vapor-deposited polyolefins at the solid/vacuum interface, Prog. Org. Coat. 143 (2020) 105630.
Journal of Alloys and Compounds
J. Houška, P. Macháňová, M. Zítek, P. Zeman
Molecular dynamics and experimental study of the growth, structure and properties of Zr–Cu films, J. Alloys Compd. 828 (2020) 154433.
Journal of Vacuum Science & Technology A
A.D. Pajdarová, J. Vlček
Effects of power per pulse on reactive HiPIMS deposition of ZrO2 films: A time-resolved optical emission spectroscopy study, J. Vac. Sci. Technol. A. 37 (2019) 061305.
Thin Solid Films
J. Musil, Z. Čiperová, R. Čerstvý, S. Haviar
Flexible hard (Zr, Si) alloy films prepared by magnetron sputtering, Thin Solid Films 688 (2019) 137216.
Thin Solid Films
P. Mareš, J. Vlček, J. Houška, J. Kohout, J. Čapek
Effect of energetic particles on pulsed magnetron sputtering of hard nanocrystalline MBCN (M = Ti, Zr, Hf) films with high electrical conductivity, Thin Solid Films 688 (2019) 137334.
Acta Materialia
J. Houška
Maximum N content in a-CNx by ab-initio simulations, Acta Mater. 174 (2019) 189–194.
Thin Solid Films
J. Rezek, P. Novák, J. Houška, A.D. Pajdarová, T. Kozák
High-rate reactive high-power impulse magnetron sputtering of transparent conductive Al-doped ZnO thin films prepared at ambient temperature, Thin Solid Films 679 (2019) 35–41.
Materials Letters
J. Musil, M. Jaroš, Š. Kos
Superhard metallic coatings, Mater. Lett. 247 (2019) 32–35.
Scientific Reports
Y. Shen, J. C. Jiang, P. Zeman, V. Šímová, J. Vlček, E. I. Meletis
Microstructure evolution in amorphous Hf–B–Si–C–N high temperature resistant coatings after annealing to 1500 °C in air, Sci. Rep. 9 (2019) 3603.
Materials Letters
M. Jaroš, J. Musil, S. Haviar
Interrelationships among macrostress, microstructure and mechanical behavior of sputtered hard Ti(Al,V)N films, Mater. Lett. 235 (2019) 92–96.
Japanese Journal of Applied Physics
J. Musil, Š. Kos, M. Jaroš, R. Čerstvý, S. Haviar, S. Zenkin, Z. Čiperová
Coating of overstoichiometric transition metal nitrides (TMNx (x > 1)) by magnetron sputtering, Jpn. J. Appl. Phys. 58 (2019) SAAD10.
Journal of Physics D: Applied Physics
J. Vlček, D. Kolenatý, T. Kozák, J. Houška, J. Čapek, Š. Kos
Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS, J. Phys. D-Appl. Phys. 52 (2019) 025205.
Tribology International
D. Javdošňák, J. Musil, Z. Soukup, S. Haviar, R. Čerstvý, J. Houška
Tribological properties and oxidation resistance of tungsten and tungsten nitride films at temperatures up to 500 °C, Tribol. Int. 132 (2019) 211–220.
Solar Energy Materials and Solar Cells
J. Houška, D. Kolenatý, J. Vlček, T. Bárta, J. Rezek, R. Čerstvý
Significant improvement of the performance of ZrO2/V1‒xWxO2/ZrO2 thermochromic coatings by utilizing a second-order interference, Sol. Energy Mater. Sol. Cells 191 (2019) 365–371.
Surface and Coatings Technology
J.A. Santiago, I. Fernández-Martínez, T. Kozák, J. Čapek, A. Wennberg, J.M. Molina-Aldareguia, V. Bellido-González, R. González-Arrabal, M.A. Monclús
The influence of positive pulses on HiPIMS deposition of hard DLC coatings, Surf. Coat. Technol. 358 (2019) 43–49.
Journal of Alloys and Compounds
M. Zítek, P. Zeman, M. Kotrlová, R. Čerstvý
Impact of Al or Si addition on properties and oxidation resistance of magnetron sputtered Zr–Hf–Al/Si–Cu metallic glasses, J. Alloy. Compd. 772 (2019) 409–417.
Ceramics International
J. Čapek, Š. Batková, S. Haviar, J. Houška, R. Čerstvý, P. Zeman
Effect of annealing on structure and properties of Ta–O–N films prepared by high power impulse magnetron sputtering, Ceram. Int. 45 (2019) 9454–9461.
Vacuum
G. Remnev, V. Tarbokov, S. Pavlov, F. Konusov, S. Zenkin, J. Musil
Irradiation of sputtered Al–Si–N coatings by pulsed 200 keV C+ ion beam, Vacuum 158 (2018) 65–67.
International journal of hydrogen energy
S. Haviar, J. Čapek, Š. Batková, N. Kumar, F. Dvořák, T. Duchoň, M. Fialová, P. Zeman
Hydrogen gas sensing properties of WO3 sputter-deposited thin films enhanced by on-top deposited CuO nanoclusters, Int. J. Hydrog. Energy 43 (2018) 22756–22764.
Vacuum
M. Jaroš, J. Musil, R.Čerstvý, S. Haviar
Effect of energy on macrostress in Ti(Al,V)N films prepared by magnetron sputtering, Vacuum 158 (2018) 52–59.
Plasma Sources Science Technology
T. Kozák, J. Lazar
Gas rarefaction in high power impulse magnetron sputtering: comparison of a particle simulation and volume-averaged models, Plasma Sources Sci. Technol. 27 (2018) 115012.
Journal of Non-Crystalline Solids
M. Kotrlová, P. Zeman, Š. Zuzjaková, M. Zítek
On crystallization and oxidation behavior of Zr54Cu46 and Zr27Hf27Cu46 thin-film metallic glasses compared to a crystalline Zr54Cu46 thin-film alloy, J. Non-Cryst. Solids. 500 (2018) 475–481.
Journal of Alloys and Compounds
D. Kolenatý, J. Houška, J. Vlček
Improved performance of thermochromic VO2/SiO2 coatings prepared by low-temperature pulsed reactive magnetron sputtering: Prediction and experimental verification, J. Alloys Compd. 767 (2018) 46–51.
Journal of Vacuum Science & Technology A
J. Musil, M. Jaroš, Š. Kos, R. Čerstvý, S. Haviar
Hard TiN2 dinitride films prepared by magnetron sputtering, J. Vac. Sci. Technol. A. 36 (2018) 040602.
Thin Solid Films
P. Novák, J. Očenášek, T. Kozák, J. Savková
Identification of electrical properties in individual thickness layers in aluminium-doped zinc oxide films sputtered at 100 °C, Thin Solid Films 660 (2018) 471–476.
Thin Solid Films
J. Houška, D. Kolenatý, J. Vlček, R. Čerstvý
Properties of thermochromic VO2 films prepared by HiPIMS onto unbiased amorphous glass substrates at a low temperature of 300 °C, Thin Solid Films 660 (2018) 463–470.
Thin Solid Films
J. Rezek, J. Houška, M. Procházka, S. Haviar, T. Kozák, P. Baroch
In‒Ga‒Zn‒O thin films with tunable optical and electrical properties prepared by high-power impulse magnetron sputtering, Thin Solid Films 658 (2018) 27–32.
Physica Status Solidi A
P. Novák, T. Kozák, P. Šutta, M. Kolega, O. Bláhová
Influence of Oxygen on the Resistivity of Co-Sputtered Transparent AZO Films, Phys. Status Solidi A (2018) 1700951.
Wear
S.A.A. Dilawary, A. Motallebzadeh, Š. Houdková, R. Medlín, S. Haviar, F. Lukáč, M. Afzal, H. Cimenoglu
Modification of M2 hardfacing: Effect of molybdenum alloying and laser surface melting on microstructure and wear performance, Wear 404–405 (2018) 111–121.
Thin Solid Films
V. Šímová, J. Vlček, Š. Zuzjaková, J. Houška, Y. Shen, J. Jiang, E.I. Meletis, V. Peřina
Magnetron sputtered Hf–B–Si–C–N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance, Thin Solid Films 653 (2018) 333–340.
Surface and Coatings Technology
J. Rezek, J. Vlček, J. Houška, J. Čapek, P. Baroch
Enhancement of the deposition rate in reactive mid-frequency ac magnetron sputtering of hard and optically transparent ZrO2 films, Surf. Coat. Technol. 336 (2018) 54–60.
Surface and Coatings Technology
J. Musil, Š. Kos, S. Zenkin, Z. Čiperová, D. Javdošňák, R. Čerstvý
β- (Me1, Me2) and MeNx films deposited by magnetron sputtering: Novel heterostructural alloy and compound films, Surf. Coat. Technol. 337 (2018) 75–81.
Journal of Alloys and Compounds
M. Zítek, P. Zeman, Š. Zuzjaková, M. Kotrlová, R. Čerstvý
Tuning properties and behavior of magnetron sputtered Zr–Hf–Cu metallic glasses, J. Alloys Compd. 739 (2018) 848–855.
Journal of Vacuum Science & Technology A
J.M. Zhang, J. Jiang, P. Zeman, Š. Zuzjaková, J. Vlček, E.I. Meletis
Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film, J. Vac. Sci. Technol. A. 36 (2018) 021505.
Surface and Coatings Technology
Š. Zuzjaková, P. Zeman, S. Haviar, R. Čerstvý, J. Houška, J. Rezek, J. Vlček
Thermal stability of structure, microstructure and enhanced properties of Zr–Ta–O films with a low and high Ta content, Surf. Coat. Technol. 335 (2018) 95–103.
Surface and Coatings Technology
M. Jaroš, J. Musil, R. Čerstvý, S. Haviar
Effect of energy on structure, microstructure and mechanical properties of hard Ti(Al,V)Nx films prepared by magnetron sputtering, Surf. Coat. Technol. 332 (2017) 190–197.
Molecules
J. Musil
Flexible Antibacterial Coatings, Molecules 22 (2017) 813.
Vacuum
P. Pokorný, J. Musil, J. Lančok, P. Fitl, M. Novotný, J. Bulíř, J. Vlček
Mass spectrometry investigation of magnetron sputtering discharges, Vacuum 143 (2017) 438–443.
Journal of Vacuum Science & Technology A
J. Musil, M. Jaroš
Plasma and floating potentials in magnetron discharges, J. Vac. Sci. Technol. A. 35 (2017) 060605.
Surface and Coatings Technology
J. Musil, S. Zenkin, R. Čerstvý, S. Haviar, Z. Čiperová
(Zr,Ti,O) alloy films with enhanced hardness and resistance to cracking prepared by magnetron sputtering, Surf. Coat. Technol. 322 (2017) 86–91.
Molecular Simulation
M. Matas, J. Houška
Strong effect of the interaction potential cut-off on the crystallinity of films grown by simulations, Mol. Simul. 43 (2017) 1436–1441.
Journal of Physics D: Applied Physics
J. Vlček, D. Kolenatý, J. Houška, T. Kozák, R. Čerstvý
Controlled reactive HiPIMS—effective technique for low-temperature (300 °C) synthesis of VO2 films with semiconductor-to-metal transition, J. Phys. D-Appl. Phys. 50 (2017) 38LT01.
Applied Surface Science
J. Houška, D. Kolenatý, J. Rezek, J. Vlček
Characterization of thermochromic VO2 (prepared at 250 °C) in a wide temperature range by spectroscopic ellipsometry, Appl. Surf. Sci. 421 (2017) 529–534.
Journal of Applied Physics
T. Kozák, J. Vlček
Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study, J. Appl. Phys. 122 (2017) 043304.
Annals of Anatomy
L. Eberlová, V. Liška, H. Mirka, Z. Tonar, S. Haviar, M. Svoboda, J. Beneš, R. Palek, M. Emingr, J. Rosendorf, P. Mik, S. Leupen, A. Lametschwandtner
The use of porcine corrosion casts for teaching human anatomy, Ann. Anat. 213 (2017) 69–77.
Thin Solid Films
P. Novák, J. Briscoe, T. Kozák, M. Kormunda, M. Netrvalová, Š. Bachratá
Optimization of sputtered ZnO transparent conductive seed layer for flexible ZnO-nanorod-based devices, Thin Solid Films 634 (2017) 169–174.
Plasma Processes and Polymers
P. Koelman, S. Heijkers, S. T. Mousavi, W. Graef, D. Mihailova, T. Kozák, A. Bogaerts, J. van Dijk
A Comprehensive Chemical Model for the Splitting of CO2 in Non-Equilibrium Plasmas, Plasma Process. Polym. 14 (2017) 1600155.
Plasma Processes and Polymers
A. Bogaerts, C. De Bie, R. Snoeckx, T. Kozák
Plasma based CO2 and CH4 conversion: A modeling perspective, Plasma Process. Polym. 14 (2017) 1600070.
Journal of Applied Physics
J. Houška, T. Kozák
Relationships between the distribution of O atoms on partially oxidized metal (Al, Ag, Cu, Ti, Zr, Hf) surfaces and the adsorption energy: A density-functional theory study, J. Appl. Phys. 121 (2017) 225303.
Computational Materials Science
J. Houška
Force field for realistic molecular dynamics simulations of TiO2 growth, Comput. Mater. Sci. 134 (2017) 1–7.
Journal of Vacuum Science & Technology A
A. Belosludtsev, J. Vlček, J. Houška, R. Čerstvý
Reactive high-power impulse magnetron sputtering of ZrO2 films with gradient ZrOx interlayers on pretreated steel substrates, J. Vac. Sci. Technol. A. 35 (2017) 031503.
Journal of Applied Physics
J. Čapek, S. Kadlec
Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Experiment, J. Appl. Phys. 121 (2017) 171911.
Journal of Applied Physics
S. Kadlec, J. Čapek
Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Model, J. Appl. Phys. 121 (2017) 171910.
Journal of Applied Physics
N. Britun, S. Konstantinidis, A. Belosludtsev, T. Silva, R. Snyders
Quantification of the hysteresis and related phenomena in reactive HiPIMS discharges, J. Appl. Phys. 121 (2017) 171905.
Journal of Applied Physics
A. D. Pajdarová, J. Vlček, J. Rezek
Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering, J. Appl. Phys. 121 (2017) 171908.
International Journal of Hydrogen Energy
S. Haviar, Š. Chlupová, P. Kúš, M. Gillet, Vl. Matolín, I. Matolínová
Micro-contacted self-assembled tungsten oxide nanorods for hydrogen gas sensing, Int. J. Hydrogen Energy 42 (2017) 1344‒1352.
Ceramics International
A. Belosludtsev, J. Houška, J. Vlček, S. Haviar, R. Čerstvý, J. Rezek, M. Kettner
Structure and properties of Hf–O–N films prepared by high-rate reactive HiPIMS with smoothly controlled composition, Ceram. Int. 43 (2017) 5661–5667.
Journal of Physics D: Applied Physics
N. Britun, A. Belosludtsev, T. Silva, R. Snyders
Ground state atomic oxygen in high-power impulse magnetron sputtering: a quantitative study, J. Phys. D-Appl. Phys. 50 (2017) 075204.
Journal of Vacuum Science & Technology A
J. Musil, M. Jaroš, R. Čerstvý, S. Haviar
Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions, J. Vac. Sci. Technol. A. 35 (2017) 020601.
Journal of Alloys and Compounds
P. Zeman, M. Zítek, Š. Zuzjaková, R. Čerstvý
Amorphous Zr–Cu thin-film alloys with metallic glass behavior, J. Alloys Compd. 696 (2017) 1298–1306.
Thin Solid Films
N.-W. Pi, M. Zhang, J. Jiang, A. Belosludtsev, J. Vlček, J. Houška, E. I. Meletis
Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control. Thin Solid Films 619 (2016) 239–249.
Thin Solid Films
J. Houska, P. Mares, V. Simova, S. Zuzjakova, R. Cerstvy, J. Vlcek
Dependence of characteristics of MSiBCN (M=Ti, Zr, Hf) on the choice of metal element: Experimental and ab-initio study. Thin Solid Films 616 (2016) 359–365.
Surface and Coatings Technology
J. Musil, G. Remnev, V. Legostaev, V. Uglov, c, A. Lebedynskiy, A. Lauk, J. Procházka, S. Haviar, E. Smolyanskiy
Flexible hard Al–Si–N films for high temperature operation, Surf. Coat. Technol. 307 (2016) 1112–1118.
Surface and Coatings Technology
J. Vlček, A. Belosludtsev, J. Rezek, J. Houška, J. Čapek, R. Čerstvý, S. Haviar
High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films, Surf. Coat. Technol. 290 (2016) 58–64.
Vacuum
J. Musil, D. Javdošňák, R. Čerstvý, S. Haviar, G. Remnev, V. Uglov
Effect of energy on the formation of flexible hard Al–Si–N films prepared by magnetron sputtering, Vacuum, 133 (2016) 43–45.
Folia Morphologica
L. Eberlova, V. Liska, H. Mirka , T. Gregor, Z. Tonar, R. Palek, M. Skala, J. Bruha, O. Vycital, K. Kalusova, S. Haviar, M. Kralickova, A. Lametschwandtner
Porcine Liver Vascular Bed in Biodur E20 Corrosion Casts., Folia Morphol. 75(2) (2016) 154–161.
Surface and Coatings Technology
J. Houška
Molecular dynamics study of the growth of crystalline ZrO2, Surf. Coat. Technol. 304 (2016) 23–30.
Plasma Sources Science Technology
J. Benedikt, D. Schröder, S. Schneider, G. Willems, A. Pajdarová, J. Vlček, V. Schulz-von der Gathen
Absolute OH and O radical densities in effluent of a He/H2O micro-scaled atmospheric pressure plasma jet, Plasma Sources Sci. Technol. 25 (2016) 045013.
Applied Physics Letters
S. Zenkin, A. Belosludtsev, Š. Kos, R. Čerstvý, S. Haviar, M. Netrvalová
Thickness dependent wetting properties and surface free energy of HfO2 thin films, Appl. Phys. Lett. 108 (2016) 231602.
Vacuum
J. Musil, S. Zenkin, Š. Kos, R. Čerstvý, S. Haviar
Flexible hydrophobic ZrN nitride films, Vacuum 131 (2016) 34–38.
Applied Surface Science
J. Musil, J. Sklenka, R. Čerstvý
Protection of brittle film against cracking, Appl. Surf. Sci. 370 (2016) 306–311.
Ceramics International
P. Zeman, Š. Zuzjaková, P. Mareš, R. Čerstvý, M. Zhang, J. Jiang, E.I. Meletis, J. Vlček
Superior high-temperature oxidation resistance of magnetron sputtered Hf–B–Si–C–N film, Ceram. Int. 42 (2016) 4853–4859.
Applied Surface Science
P. Novák, J. Očenášek, L. Prušáková, V. Vavruňková, J. Savková, J. Rezek
Influence of heat generated by a Raman excitation laser on the structural analysis of thin amorphous silicon film, Appl. Surf. Sci. 364 (2016) 302–307.
Journal of Vacuum Science & Technology A
J. Musil, M. Zítek, K. Fajfrlík, R. Čerstvý
Flexible antibacterial Zr–Cu–N thin films resistant to cracking, J. Vac. Sci. Technol. A. 34 (2016) 021508.
Ceramics International
J. Houška, P. Steidl, J. Vlček, J. Martan
Thermal, mechanical and electrical properties of hard B4C, BCN, ZrBC and ZrBCN ceramics, Ceram. Int. 42 (2016) 4361–4369.
Journal of Physics D: Applied Physics
T. Kozák, J. Vlček
A parametric model for reactive high-power impulse magnetron sputtering of films, J. Phys. D-Appl. Phys. 49 (2016) 055202.
Applied optics
M. Švantner, M. Kučera, E. Smazalová, Š. Houdková, R. Čerstvý
Thermal effects of laser marking on microstructure and corrosion properties of stainless steel. Appl. Opt. 55 (2016) D35–D45.
Computational Materials Science
J. Houška
Force field for realistic molecular dynamics simulations of ZrO2 growth, Comput. Mater. Sci. 111 (2016) 209–217.
Applied Surface Science
M. Zhang, J. Jiang, P. Mareš, J. Houška, J. Vlček, E.I. Meletis
Effect of the Si content on the microstructure of hard, multifunctional Hf–B–Si–C films prepared by pulsed magnetron sputtering, Appl. Surf. Sci. 357 (2015) 1343–1354.
International Journal of Nanomanufacturing
J. Musil, P. Stupka, Š. Zuzjaková, R. Čerstvý
Physical and mechanical properties of Ti/Al multilayer heat releasing coatings, Int. J. Nanomanuf. 11 (2015) 78–93.
The Journal of Physical Chemistry C
S. Heijkers, R. Snoeckx, T. Kozák, T. Silva, T. Godfroid, N. Britun, et al.
CO2 Conversion in a Microwave Plasma Reactor in the Presence of N2 : Elucidating the Role of Vibrational Levels, J. Phys. Chem. C 119 (2015) 12815–12828.
RSC Advances
J. Musil
Flexible hard nanocomposite coatings, RSC Adv. 5 (2015) 60482–60495
Thin Solid Films
D. Batory, A. Jedrzejczak, W. Szymanski, P. Niedzielski, M. Fijalkowski, P. Louda, et al.,
Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method, Thin Solid Films 590 (2015) 299–305.
Ceramic International
J. Houska
Ageing resistance of SiBCN ceramics, Ceram. Int. 41 (2015) 7921–7928.
Thin Solid Films
J. Houska, J. Kohout, P. Mares, R. Cerstvy, J. Vlcek
Dependence of structure and properties of hard nanocrystalline conductive films MBCN (M=Ti, Zr, Hf) on the choice of metal element, Thin Solid Films 586 (2015) 22–27.
Vacuum
J. Vlček, J. Rezek, J. Houška, T. Kozák, J. Kohout
Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films, Vacuum 114 (2015) 131–141.
Surface and Coatings Technology
J. Musil, J. Blažek, K. Fajfrlík, R. Čerstvý
Flexible antibacterial Al–Cu–N films, Surf. Coat. Technol. 264 (2015) 114–120.
Ceramics International
Š. Zuzjaková, P. Zeman, J. Houška, R. Čerstvý, J. Musil
Thermal stability and transformation phenomena in magnetron sputtered Al–Cu–O films, Ceram. Int. 41 (2015) 6020–6029.
Journal of Materials Science and Engineering A
MUSIL, J., JÍLEK, R., ČERSTVÝ, R.
Flexible Ti-Ni-N Thin Films Prepared by Magnetron Sputtering. Journal of Materials Science and Engineering A, 4 (2014) 27–33.
Surface and Coatings Technology
J. Kohout, J. Vlček, J. Houška, P. Mareš, R. Čerstvý, P. Zeman, et al.
Hard multifunctional Hf–B–Si–C films prepared by pulsed magnetron sputtering, Surf. Coat. Technol. 257 (2014) 301–307.
Surface and Coatings Technology
J. Houska
Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study, Surf. Coat. Technol. 254 (2014) 131–137.
Journal of Vacuum Science & Technology A
J. Musil, M. Hromádka, R. Čerstvý, Z. Soukup
Mechanical and tribological properties of Sn–Cu–O films prepared by reactive magnetron sputtering, J. Vac. Sci. Technol. A: Vacuum, Surfaces, and Films 32 (2014) 021504.
Thin Solid Films
J. Rezek, J. Vlček, J. Houška, R. Čerstvý
High-rate reactive high-power impulse magnetron sputtering of Ta–O–N films with tunable composition and properties, Thin Solid Films 566 (2014) 70–77.
Acta Materialia
M. Zhang, J. Jiang, J. Houška, J. Kohout, J. Vlček, E.I. Meletis
A study of the microstructure evolution of hard Zr–B–C–N films by high-resolution transmission electron microscopy, Acta Mater. 77 (2014) 212–222.
Journal of the American Ceramic Society
S. Zenkin, Š. Kos, J. Musil
Hydrophobicity of Thin Films of Compounds of Low-Electronegativity Metals, J. Am. Ceram. Soc. 97 (2014) 2713–2717.
Surface and Coatings Technology
J. Musil, J. Sklenka, J. Prochazka
Protective over-layer coating preventing cracking of thin films deposited on flexible substrates, Surf. Coat. Technol. 240 (2014) 275–280.
Surface and Coatings Technology
P. Zeman, Š. Zuzjaková, J. Blažek, R. Čerstvý, J. Musil
Thermally activated transformations in metastable alumina coatings prepared by magnetron sputtering, Surf. Coat. Technol. 240 (2014) 7–13.
Surface and Coatings Technology
B. Grančič, M. Mikula, T. Roch, P. Zeman, L. Satrapinskyy, M. Gregor, et al.
Effect of Si addition on mechanical properties and high temperature oxidation resistance of Ti–B–Si hard coatings, Surf. Coat. Technol. 240 (2014) 48–54.
Surface and Coatings Technology
J. Vlček, J. Rezek, J. Houška, R. Čerstvý, R. Bugyi
Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films, Surf. Coat. Technol. 236 (2013) 550–556.
Thermochimica Acta
Š. Zuzjaková, P. Zeman, Š. Kos
Non-isothermal kinetics of phase transformations in magnetron sputtered alumina films with metastable structure, Thermochim. Acta. 572 (2013) 85–93.
Surface and Coatings Technology
J. Houska
Pathway for a low-temperature deposition of α-Al2O3: A molecular dynamics study, Surf. Coat. Technol. 235 (2013) 333–341.
Surface and Coatings Technology
V. Petrman, J. Houska
Trends in formation energies and elastic moduli of ternary and quaternary transition metal nitrides, J. Mater. Sci. 48 (2013) 7642–7651.
Thermochimica Acta
T. Křenek, P. Duchek, M. Urbanová, D. Pokorná, P. Bezdička, I. Jakubec, et al.
Thermal co-decomposition of silver acetylacetonate and tin(II) hexafluoroacetylacetonate: Formation of carbonaceous Ag/AgxSn(x=4 and 6.7)/SnO2 composites, Thermochim. Acta. 566 (2013) 92–99.
Applied Sufrace Science
J. Musil, J. Blažek, K. Fajfrlík, R. Čerstvý, Š. Prokšová
Antibacterial Cr–Cu–O films prepared by reactive magnetron sputtering, Appl. Surf. Sci. 276 (2013) 660–666.
Surface and Coatings Technology
J. Vlček, P. Calta, P. Steidl, P. Zeman, R. Čerstvý, J. Houška, et al.
Pulsed reactive magnetron sputtering of high-temperature Si–B–C–N films with high optical transparency, Surf. Coat. Technol. 226 (2013) 34–39.
Thin Solid Films
J. He, M. Zhang, J. Jiang, J. Vlček, P. Zeman, P. Steidl, et al.
Microstructure characterization of high-temperature, oxidation-resistant Si–B–C–N films, Thin Solid Films. 542 (2013) 167–173.
Surface and Coatings Technology
J. Musil, P. Novák, M. Hromádka, R. Čerstvý, Z. Soukup, J. Savková
Mechanical and tribological properties of sputtered Mo–O–N coatings, Surf. Coat. Technol. 215 (2013) 386–392.
Journal of Physics D: Applied Physics
J. Čapek, M. Hála, O. Zabeida, J.E. Klemberg-Sapieha, L. Martinu
Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux, J. Phys. D. Appl. Phys. 46 (2013) 205205.
Thin Solid Films
J. Houska, J. Kohout, J. Vlcek
Effect of N and Zr content on structure, electronic structure and properties of ZrBCN materials: An ab-initio study, Thin Solid Films. 542 (2013) 225–231.
Surface and Coatings Technology
J. Vlček, P. Steidl, J. Kohout, R. Čerstvý, P. Zeman, Š. Prokšová, et al.
Hard nanocrystalline Zr–B–C–N films with high electrical conductivity prepared by pulsed magnetron sputtering, Surf. Coat. Technol. 215 (2013) 186–191.
Journal of Physics D: Applied Physics
T. Kozák, J. Vlček, Š. Kos,
Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges, J. Phys. D. Appl. Phys. 46 (2013) 105203.
Plasma Sources Science Technology
T. Kozák, J. Vlček
Effect of voltage pulse characteristics on high-power impulse magnetron sputtering of copper, Plasma Sources Sci. Technol. 22 (2013) 015009.
Vacuum
J. Musil, P. Baroch
High-rate pulsed reactive magnetron sputtering of oxide nanocomposite coatings, Vacuum. 87 (2013) 96–102.
Surface and Coatings Technology
J. Houska, S. Ulrich
Stress reduction in cubic boron nitride by oxygen addition: Explanation of the mechanism by ab-initio simulations, Surf. Coat. Technol. 206 (2012) 2541–2544.
Surface and Coatings Technology
J. Musil, J. Sklenka, R. Cerstvy
Transparent Zr–Al–O oxide coatings with enhanced resistance to cracking, Surf. Coat. Technol. 206 (2012) 2105–2109.
Plasma Sources Science and Technology
T. Kozák
Effect of the target power density on high-power impulse magnetron sputtering of copper, Plasma Sources Sci. Technol. 21 (2012) 025012.
Sensors and Actuators B: Chemical
N. Andreeva, T. Ishizaki, P. Baroch, N. Saito
High sensitive detection of volatile organic compounds using superhydrophobic quartz crystal microbalance, Sensors Actuators B Chem. 164 (2012) 15–21.
Japanese Journal of Applied Physics
N. Andreeva, T. Ishizaki, P. Baroch, N. Saito
Rapid Sterilization of Escherichia coli by Solution Plasma Process, Jpn. J. Appl. Phys. 51 (2012) 126201.
Surface and Coatings Technology
J. Musil, R. Jílek, M. Meissner, T. Tölg, R. Čerstvý
Two-phase single layer Al–O–N nanocomposite films with enhanced resistance to cracking, Surf. Coat. Technol. 206 (2012) 4230–4234.
Surface and Coatings Technology
J. Musil, J. Sklenka, R. Čerstvý, T. Suzuki, T. Mori, M. Takahashi
The effect of addition of Al in ZrO2 thin film on its resistance to cracking, Surf. Coat. Technol. 207 (2012) 355–360.
Surface and Coatings Technology
J. Musil
Hard nanocomposite coatings: Thermal stability, oxidation resistance and toughness, Surf. Coat. Technol. 207 (2012) 50–65.
Journal of Applied Physics
J. Houska, S. Mraz, J.M. Schneider
Experimental and molecular dynamics study of the growth of crystalline TiO2, J. Appl. Phys. 112 (2012) 073527.
Thin Solid Films
J. Houska, J. Blazek, J. Rezek, S. Proksova
Overview of optical properties of Al2O3 films prepared by various techniques, Thin Solid Films. 520 (2012) 5405–5408.
Thin Solid Films
S.-H. Nam, S.-J. Cho, C.-K. Jung, J.-H. Boo, J. Šícha, D. Heřman, et al.
Comparison of hydrophilic properties of TiO2 thin films prepared by sol–gel method and reactive magnetron sputtering system, Thin Solid Films. 519 (2011) 6944–6950.
Surface and Coatings Technology
J. Tesař, J. Martan, J. Rezek
On surface temperatures during high power pulsed magnetron sputtering using a hot target, Surf. Coat. Technol. 206 (2011) 1155–1159.
Journal of Applied Physics
T. Kozak, A. Dagmar Pajdarova
A non-stationary model for high power impulse magnetron sputtering discharges, J. Appl. Phys. 110 (2011) 103303.
Applied Surface Science
J. Blažek, J. Musil, P. Stupka, R. Čerstvý, J. Houška
Properties of nanocrystalline Al–Cu–O films reactively sputtered by DC pulse dual magnetron, Appl. Surf. Sci. 258 (2011) 1762–1767.
Surface and Coatings Technology
J.J. Gengler, J. Hu, J.G. Jones, A.A. Voevodin, P. Steidl, J. Vlček
Thermal conductivity of high-temperature Si–B–C–N thin films, Surf. Coat. Technol. 206 (2011) 2030–2033.
Journal of Physics: Condensed matter
J. Houska, S. Kos
Ab initio modeling of complex amorphous transition-metal-based ceramics., J. Phys. Condens. Matter. 23 (2011) 025502.
Surface and Coatings Technology
J. Musil, M. Hromadka, P. Novak
Effect of nitrogen on tribological properties of amorphous carbon films alloyed with titanium, Surf. Coat. Technol. 205 (2011) S84–S88.
Journal of Vacuum Science & Technology A
O. Novak, J. Vlcek
Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 29 (2011) 031301.
Plasma Processes and Polymers
J. Šícha, O. Novák, J. Vlček, P. Kudláček
Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films, Plasma Process. Polym. 8 (2011) 191–199.
Review of Scientific Instruments
O. Novák, I.S. Falconer, R. Sanginés, M. Lattemann, R.N. Tarrant, D.R. McKenzie, et al.
Fizeau interferometer system for fast high resolution studies of spectral line shapes., Rev. Sci. Instrum. 82 (2011) 023105.
Plasma Sources Science and Technology
P. Baroch, S. Potocky, N. Saito
Generation of plasmas in water: utilization of a high-frequency, low-voltage bipolar pulse power supply with impedance control, Plasma Sources Sci. Technol. 20 (2011) 034017.
Plasma Processes and Polymers
M. Meissner, T. Tolg, P. Baroch, J. Musil
Elimination of Arcing in Reactive Sputtering of Al2O3 Thin Films Prepared by DC Pulse Single Magnetron, Plasma Process. Polym. 8 (2011) 500–504.
Acta Materialia
V. Petrman, J. Houska, S. Kos, P. Calta, J. Vlcek
Effect of nitrogen content on electronic structure and properties of SiBCN materials, Acta Mater. 59 (2011) 2341–2349.
2010
MUSIL, J., NOVÁK, P., ČERSTVÝ, R., SOUKUP, Z. Tribological and mechanical properties of nanocrystalline-TiC/a-C nanocomposite thin films. Journal of Vacuum Science and Technology A, 2010, roč. 28, č. 2, s. 244–249. ISSN: 0734-2101 link
KOS, Š., BALATSKY, A., LITTLEWOOD, P., SMITH, D. Spin noise of itinerant fermions. Physical Review B, 2010, roč. 81, č. 6, s. 0664407-1– 0664407-9. ISSN: 1098-0121 link
ONDOK, V., MUSIL, J., MEISSNER, M., ČERSTVÝ, R., FAJFRLÍK, K. Two-functional DC sputtered Cu-containing TiO2 thin films. Journal of Photochemistry and Photobiology A: Chemistry, 2010, roč. 2010, č. 209, s. 158–162. ISSN: 1010-6030 link
HOUŠKA, J., KLEMBERG-SAPIEHA, J., MARTINŮ, L. Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride. Journal of Applied Physics, 2010, roč. 107, č. 8, s. 083501-1 – 083501-9. ISSN: 0021-8979 link
MUSIL, J., BLAŽEK, J., ZEMAN, P., PROKŠOVÁ, Š., ŠAŠEK, M., ČERSTVÝ, R. Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering. Applied Surface Science, 2010, roč. 257, č. 5, s. 1058–1062. ISSN: 0169-4332 link
LAZAR, J., VLČEK, J., REZEK, J. Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium. Journal of Applied Physics, 2010, roč. 108, č. 6, s. 063307-1 – 063307-9. ISSN: 0021-8979 link
KUŽEL, R., NICHTOVÁ, L., MATĚJ, Z., MUSIL, J. In-situ X-ray diffraction studies of time and thickness dependence of crystallization of amorphous TiO2 thin films and stress evolution. Thin Solid Films, 2010, roč. 519, č. 5, s. 1649–1654. ISSN: 0040-6090 link
MUSIL, J., ŠATAVA, V., BAROCH, P. High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target. Thin Solid Films, 2010, roč. 519, č. 2, s. 775–777. ISSN: 0040-6090 link
VLČEK, J., BURCALOVÁ, K. A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering. Plasma Sources Science and Technology, 2010, roč. 19, č. 6, s. 1–12. ISSN: 0963-0252 link
NOVÁK, P., MUSIL, J., ČERSTVÝ, R., JÄGER, A. Coefficient of friction and wear of sputtered a-C thin coatings containing Mo. Surface and Coatings Technology, 2010, roč. 205, č. 5, s. 1486–1490. ISSN: 0257-8972 link
HOUŠKA, J., KOS, Š. SiBCN materials for high-temperature applications: Atomistic origin of electrical conductivity. Journal of Applied Physics, 2010, roč. 108, č. 8, s. 083711-1/083711-7. ISSN: 0021-8979 link
MARTAN, J., ČAPEK, J., AMIN CHALHOUB, E. Measurement of thermal properties of thin films up to high temperatures - pulsed photothermal radiometry system and Si-B-C-N films. Review of Scientific Instruments, 2010, roč. 81, č. 12, s. 124902-1–124902-7. ISSN: 0034-6748 link
ZEMAN, P., ČAPEK, J., ČERSTVÝ, R., VLČEK, J. Thermal stability of magnetron sputtered Si–B–C–N materials at temperatures up to 1700 °C. Thin Solid Films, 2010, roč. 519, č. 1, s. 306–311. ISSN: 0040-6090 link
2009
MUSIL, J., ŠATAVA, V., ZEMAN, P., ČERSTVÝ, R. Protective Zr-containing SiO2 coatings resistant to thermal cycling in air up to 1400 °C. Surface and Coatings Technology, 2009, roč. 203, č. 10–11, s. 1502–1507. ISSN: 0257-8972
MUSIL, J., LOUDA, M., ČERSTVÝ, R., BAROCH, P., DITTA, I., STEELE, A., FOSTER, H. Two-Functional Direct Current Sputtered Silver-Containing Titanium Dioxide Thin Films. Nanoscale Research Letters, 2009, roč. 4, č. 4, s. 313–320. ISSN: 1931-7573
SEMMAR, N., TEBIB, M., TESAŘ, J., PUSCAS, N., AMIN-CHALHOUB, E. Direct observation of phase transitions by time-resolved pyro/reflectometry of KrF laser-irradiated metal oxides and metals. Applied Surface Science, 2009, roč. 255, č. 10, s. 5549–5552. ISSN: 0169-4332
KALAŠ, J., VERNHES, R., HŘEBEN, S., VLČEK, J., KLEMBERG-SAPIEHA, J., MARTINŮ, L. High-temperature stability of the mechanical and optical properties of Si–B–C–N films prepared by magnetron sputtering. Thin Solid Films, 2009, roč. 518, č. 1, s. 174–179. ISSN: 0040-6090
HONNER, M., ŠROUB, J. Modeling of Thermal Spraying Heat Transfer Processes by Exodus Stochastic Method. Journal of Thermal Spray Technology, 2009, roč. 18, č. 5–6, s. 1014–1021. ISSN: 1059-9630
PAJDAROVÁ, A., VLČEK, J., KUDLÁČEK, P., LUKÁŠ, J. Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges. Plasma Sources Science and Technology, 2009, roč. 18, č. 2, s. 025008-1–025008-7. ISSN: 0963-0252
2008
HECIMOVIC, A., BURCALOVÁ, K., EHIASARIAN, A.P. Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge. Journal of Physics D: Applied Physics, 2008, roc. 41, s. 095203-1–095203-10. ISSN: 0022-3727
KUDLÁČEK, P., VLČEK, J., BURCALOVÁ, K., LUKÁŠ, J. Highly ionized fluxes of sputtered titanium atoms in high-power pulsed magnetron discharges. Plasma Sources Science and Technology, 2008, roč. 17, č. 2, s. 025010-1–025010-8. ISSN: 0963-0252
MUSIL, J., ŠAŠEK, M., ZEMAN, P., ČERSTVÝ, R., HEŘMAN, D., HAN, J., ŠATAVA, V. Properties of magnetron sputtered Al–Si–N thin films with a low and high Si content. Surface and Coatings Technology, 2008, roč. 202, č. 15, s. 3485–3493. ISSN: 0257-8972
ŠÍCHA, J., MUSIL, J., MEISSNER, M., ČERSTVÝ, R. Nanostructure of photocatalytic TiO2 films sputtered at temperatures below 200 °C. Applied Surface Science, 2008, roč. 254, č. 13, s. 3793–3800. ISSN: 0169-4332
MARTAN, J., SEMMAR, N., CIBULKA, O. Precise nanosecond time resolved infrared radiometry measurements of laser induced silicon phase change and melting front propagation. Journal of Applied Physics, 2008, roč. 103, č. 8, s. 084909-1–084909-3. ISSN: 0021-8979
BURCALOVÁ, K., HECIMOVIC, A., EHIASARIAN, A. Ion energy distributions and efficiency of sputtering process in HIPIMS system. Journal of Physics D: Applied Physics, 2008, roč. 41, č. 11, s. 115306-1–115306-6. ISSN: 0022-3727
BAROCH, P., SAITO, N., TAKAI, O. Special type of plasma dielectric barrier discharge reactor for direct ozonization of water and degradation of organic pollution. Journal of Physics D: Applied Physics, 2008, roč. 41, č. 8, s. 085207-1–085207-6. ISSN: 0022-3727
ČAPEK, J., HŘEBEN, S., ZEMAN, P., VLČEK, J., ČERSTVÝ, R., HOUŠKA, J. Effect of the gas mixture composition on high-temperature behavior of magnetron sputtered Si–B–C–N coatings. Surface and Coatings Technology, 2008, roč. 0, č. 203, s. 466–469. ISSN: 0257-8972
ČÍŽEK, J., VLČEK, J., POTOCKÝ, Š., HOUŠKA, J., SOUKUP, Z., KALAŠ, J., JEDRZEJOWSKI, P., KLEMBERG-SAPIEHA, J., MARTINŮ, L. Mechanical and optical properties of quaternary Si–B–C–N films prepared by reactive magnetron sputtering. Thin Solid Films, 2008, roč. 516, č. 21, s. 7286–7293. ISSN: 0040-6090
BAROCH, P., SAITO, N. Bipolar Pulsed Electrical Discharges in Liquid. IEEE Transactions on Plasma Science, 2008, roč. 36, č. 4, s. 1156–1157. ISSN: 0093-3813
BAROCH, P., MUSIL, J. Plasma Drift in Dual Magnetron Discharge. IEEE Transactions on Plasma Science, 2008, roč. 36, č. 4, s. 1412–1413. ISSN: 0093-3813
MUSIL, J., ŠATAVA, V., ČERSTVÝ, R., ZEMAN, P., TÖLG, T. Formation of crystalline Al–Ti–O thin films and their properties. Surface and Coatings Technology, 2008, roč. 202, č. 24, s. 6064–6069. ISSN: 0257-8972
MUSIL, J., LOUDA, M., SOUKUP, Z., KUBÁSEK, M. Relationship between mechanical properties and coefficient of friction of sputtered a-C/Cu composite thin films. Diamond and Related Materials, 2008, roč. 17, č. 11, s. 1905–1911. ISSN: 0925-9635
VLČEK, J., HŘEBEN, S., KALAŠ, J., ČAPEK, J., ZEMAN, P., ČERSTVÝ, R., PEŘINA, V., SETSUHARA, Y. Magnetron sputtered Si–B–C–N films with high oxidation resistance and thermal stability in air at temperatures above 1500' C. Journal of Vacuum and Science Technology A, 2008, roč. 26, č. 5, s. 1101–1108. ISSN: 0734-2101
MUSIL, J., VLČEK, J., ZEMAN, P. Hard amorphous nanocomposite coatings with oxidation resistance above 1000 °C. Advances in Applied Ceramics, 2008, roč. 107, č. 3, s. 148–154. ISSN: 1743-6753
J. Soldán, J. Neidhardt, B. Sartory, R. Kaindl, R. Čerstvý, P.H. Mayrhofer, R. Tessadri, P. Polcik, M. Lechthaler, C. Mitterer, Structure-property relations of arc-evaporated Al–Cr–Si–N coatings, Surf. Coatings Technol. 202 (2008) 3555–3562. doi:10.1016/j.surfcoat.2007.12.041.
2007
HOUŠKA, J., VLČEK, J., POTOCKÝ, Š., PEŘINA, V. Influence of substrate bias voltage on structure and properties of hard Si–B–C–N films prepared by reactive magnetron sputtering. Diamond and Related Materials, 2007, roč. 16, č. 1, s. 29–36. ISSN: 0925-9635
SHAGINYAN, L., KIM, Y., HAN, J., BRITUN, N., MUSIL, J., BELOUSOV, I. Novel model for film growth based on surface temperature developing during magnetron sputtering. Surface and Coatings Technology, 2007, roč. 202, č. 3, s. 486–493. ISSN: 0257-8972
MUSIL, J., ZEMAN, P. Hard a-Si3N4/MeNx Nanocomposite Coatings with High Thermal Stability and High Oxidation Resistance. Solid State Phenomena, 2007, roč. 127, s. 31–36. ISSN: 1012-0394
MARTAN, J., KUNEŠ, J., SEMMAR, N. Experimental mathematical model of nanosecond laser interaction with material. Applied Surface Science, 2007, roč. 253, č. 7, s. 3525–3532. ISSN: 0169-4332
VLČEK, J., KUDLÁČEK, P., BURCALOVÁ, K., MUSIL, J. Ion flux characteristics in high-power pulsed magnetron sputtering discharges. Europhysics Letters, 2007, roč. 77, č. 4, s. 45002-1–45002-5. ISSN: 0295-5075
MUSIL, J., JIROUT, M. Toughness of hard nanostructured ceramic thin films. Surface and Coatings Technology, 2007, roč. 201, č. 9–11, s. 5148–5152. ISSN: 0257-8972
HOUŠKA, J., KALAŠ, J., VLČEK, J., BILEK, M., MCKENZIE, D. Effect of implanted argon on hardness of novel magnetron sputtered Si–B–C–N materials: experiments and ab initio simulations. Journal of Physics: Condensed Matter, 2007, roč. 19, č. 19, s. 1–13. ISSN: 0953-8984
SOLDÁN, J., MUSIL, J., ZEMAN, P. Effect of Al Addition on Structure and Properties of Sputtered TiC Films. Plasma Processes and Polymers, 2007, roč. 4, č. S1, s. S6–S10. ISSN: 1612-8850
ŠÍCHA, J., HEŘMAN, D., MUSIL, J., STRÝHAL, Z., PAVLÍK, J. Surface Morphology of Magnetron Sputtered TiO2 Films. Plasma Processes and Polymers, 2007, roč. 4, č. S1, s. S345–S349. ISSN: 1612-8850
ONDOK, V., MUSIL, J. Effect of Hydrogen on Reactive Sputtering of Transparent Oxide Films. Plasma Processes and Polymers, 2007, roč. 4, č. S1, s. S319–S324. ISSN: 1612-8850
KUDLÁČEK, P., VLČEK, J., HOUŠKA, J., HAN, J., JUNG, M., KIM, Y. Ion-bombardment characteristics during deposition of TiN films using a grid-assisted magnetron system with enhanced plasma potential. Vacuum, 2007, roč. 81, č. 9, s. 1109–1113. ISSN: 0042-207X
MUSIL, J., ŠÍCHA, J., HEŘMAN, D., ČERSTVÝ, R. Role of energy in low-temperature high-rate formation of hydrophylic TiO2 thin films using pulsed magnetron sputtering. Journal of Vacuum Science and Technology A, 2007, roč. 25, č. 1, s. 666–674. ISSN: 0734-2101
HEŘMAN, D., ŠÍCHA, J., MUSIL, J. Photoactivated Properties of TiO2 Films Prepared by Magnetron Sputtering. Plasma Processes and Polymers, 2007, roč. 4, č. S1, s. S531–S535. ISSN: 1612-8850
MUSIL, J., ZEMAN, P., JIROUT, M., ŠAŠEK, M., ČERSTVÝ, R. Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr–Cu–O Films during Thermal Annealing in Flowing Air. Plasma Processes and Polymers, 2007, roč. 4, č. S1, s. S536–S540. ISSN: 1612-8850
MUSIL, J., ZEMAN, P., DOHNAL, P. Ti–Si–N Films with a High Content of Si. Plasma Processes and Polymers, 2007, roč. 4, č. S1, s. S574–S578. ISSN: 1612-8850
KUŽEL, R., NICHTOVÁ, L., HEŘMAN, D., ŠÍCHA, J., MUSIL, J. Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering. Zeitschrift für Kristallographie, 2007, roč. 2007, č. suppl. 26, s. 241–246. ISSN: 0044-2968
KUŽEL, R., NICHTOVÁ, L., MATĚJ, Z., HEŘMAN, D., ŠÍCHA, J., MUSIL, J. Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering. Zeitschrift für Kristallographie, 2007, roč. 2007, č. suppl. 26, s. 247–252. ISSN: 0044-2968
MARTAN, J., HERVÉ, O., LANG, V. Two-detector measurement system of pulse photothermal radiometry for the investigation of the thermal properties of thin films. Journal of Applied Physics, 2007, roč. 102, č. 6, s. 064903-1–064903-6. ISSN: 0021-8979
NICHTOVÁ, L., KUŽEL, R., MATĚJ, Z., ŠÍCHA, J., MUSIL, J. Magnetron deposited TiO2 thin films crystallization and temperature dependence of microstructure and phase composition. Materials Structure in Chemistry, Biology, Physics and Technology, 2007, roč. 14, č. 2, s. 139–140. ISSN: 1211-5894
ŠÍCHA, J., HEŘMAN, D., MUSIL, J., STRÝHAL, Z., PAVLÍK, J. High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2 films: the effect of repetition frequency. Nanoscale Research Letters, 2007, roč. 2, č. 3, s. 123–129. ISSN: 1931-7573
HOUŠKA, J., ČAPEK, J., VLČEK, J., BILEK, M., MCKENZIE, D. Bonding statistics and electronic structure of novel Si–B–C–N materials: Ab initio calculations and experimental verification. Journal of Vacuum Science and Technology A, 2007, roč. 25, č. 5, s. 1411–1416. ISSN: 0734-2101
MARTAN, J., SEMMAR, N., BOULMER-LEBORGNE, C. IR radiometry optical system view factor and its application to emissivity investigations of solid and liquid phases. International Journal of Thermophysics, 2007, roč. 28, č. 4, s. 1342–1352. ISSN: 0195-928X
KUŽEL, R., MATĚJ, Z., ŠÍCHA, J., MUSIL, J. Structural studies of crystallization and growth of magnetron deposited TiO2 thin films by X-ray diffraction and reflectivity. Acta Crystallographica, 2007, č. 3, s. 284–285. ISSN: 0108-7673
VLČEK, J., KUDLÁČEK, P., BURCALOVÁ, K., MUSIL, J. High-power pulsed sputtering using a magnetron with enhanced plasma confinement. Journal of Vacuum Science and Technology A, 2007, roč. 25, č. 1, s. 42–47. ISSN: 0734-2101
2006
HOUŠKA, J., WARSCHKOV, O., BILEK, M., MCKENZIE, D., VLČEK, J., POTOCKÝ, Š. The effect of argon on the structure of amorphous SiBCN materals: an experimental and ab initio study. Journal of Physics: Condensed Matter, 2006, roč. 18, č. 7, s. 2337–2348. ISSN: 0953-8984
KUŽEL, R., NICHTOVÁ, L., MATĚJ, Z., HEŘMAN, D., MUSIL, J. Growth of nanocrystalline magnetron sputtered TiO2 thin films studied by X-ray scattering. Materials Structure in Chemistry, Biology, Physics and Technology, 2006, roč. 13, č. 3, s. 158–160. ISSN: 1211-5894
ZEMAN, P., MUSIL, J., DANIEL, R. High-temperature oxidation resistance of Ta–Si–N films with a high Si content. Surface and Coatings Technology, 2006, roč. 200, č. 12-13, s. 4091–4096. ISSN: 0257-8972
ŠŮNA, J., MUSIL, J., DOHNAL, P. Control of macrostress in reactively sputtered Mo–Al–N films by total gas pressure. Vacuum, 2006, roč. 80, č. 6, s. 588–592. ISSN: 0042-207X
ŠŮNA, J., MUSIL, J., ONDOK, V., HAN, J. Enhanced hardness in sputtered Zr–Ni–N films. Surface and Coatings Technology, 2006, roč. 200, č. 22–23, s. 6293–6297. ISSN: 0257-8972
MUSIL, J., HEŘMAN, D., ŠÍCHA, J. Low-temperature sputtering of crystalline TiO2 films. Journal of Vacuum Science and Technology A, 2006, roč. 24, č. 3, s. 521–528. ISSN: 0734-2101
JIROUT, M., MUSIL, J. Effect of addition of Cu into ZrOx film on its properties. Surface and Coatings Technology, 2006, roč. 200, č. 24, s. 6792–6800. ISSN: 0257-8972
SHAGINYAN, L., HAN, J., SHAGINYAN, V., MUSIL, J. Evolution of film temperature during magnetron sputtering. Journal of Vacuum Science and Technology A, 2006, roč. 24, č. 4, s. 1083–1090. ISSN: 0734-2101
VLČEK, J., POTOCKÝ, Š., HOUŠKA, J., ZEMAN, P., PEŘINA, V., SETSUHARA, Y. New quaternary Si–B–C–N films prepared by reactive magnetron sputtering. Transactions of the Materials Research Society of Japan, 2006, roč. 31, č. 2, s. 447–451. ISSN: 1382-3469
HEŘMAN, D., ŠÍCHA, J., MUSIL, J. Magnetron sputtering of TiOxNy films. Vacuum, 2006, roč. 81, č. 3, s. 285–290.
HOUŠKA, J., VLČEK, J., HŘEBEN, S., BILEK, M., MCKENZIE, D. Effect of B and the Si/C ratio on high-temperature stability of Si–B–C–N materials. Europhysics Letters, 2006, roč. 76, č. 3, s. 512–518. ISSN: 0295-5075
MARTAN, J., CIBULKA, O., SEMMAR, N. Nanosecond pulse laser melting investigation by IR radiometry and reflection-based methods. Applied Surface Science, 2006, roč. 253, č. 3, s. 1170–1177. ISSN: 0169-4332
SOLDÁN, J., MUSIL, J. Structure and mechanical properties of DC magnetron sputtered Ti/Cu films. Vacuum, 2006, roč. 81, č. 4, s. 531–538. ISSN: 0042-207X
DANIEL, R., MUSIL, J., ZEMAN, P., MITTERER, C. Thermal stability of magnetron sputtered Zr–Si–N films. Surface and Coatings Technology, 2006, roč. 201, č. 6, s. 3368–3376. ISSN: 0257-8972
ZEMAN, P., MUSIL, J. Difference in high-temperature oxidation resistance of amorphous Zr–Si–N and W–Si–N films with a high Si content. Applied Surface Science, 2006, roč. 252, č. 23, s. 8319–8325. ISSN: 0169-4332
MARTAN, J., SEMMAR, N., LEBORGNE, C., PLANTIN, P., LE MENN, E. Thermal characterization of tungsten thin films by pulsed photothermal radiometry. Nanoscale and Microscale Thermophysical Engineering, 2006, roč. 10, s. 333–344. ISSN: 1556-7265
KUŽEL, R., NICHTOVÁ, L., HEŘMAN, D., MUSIL, J. X-ray scattering study of crystallization of magnetron sputtered TiO2 thin films. Acta Crystallographica. Section A, 2006, roč. 62, č. suppl., s. 84–84. ISSN: 0108-7673
MUSIL, J., DANIEL, R., SOLDÁN, J., ZEMAN, P. Properties of reactively sputtered W–Si–N films. Surface and Coatings Technology, 2006, roč. 200, č. 12-13, s. 3886–3895. ISSN: 0257-8972
2005
MUSIL, J., DANIEL, R., ZEMAN, P., TAKAI, O. Structure and properties of magnetron sputtered Zr–Si–N films with a high Si content. Thin Solid Films, 2005, roč. 478, č. 1–2, s. 238–247. ISSN: 0040-6090
MUSIL, J., BAROCH, P., VLČEK, J., NAM, K., HAN, J. Reactive magnetron sputtering of thin films: present status and trends. Thin Solid Films, 2005, roč. 475, č. 1–2, s. 208–218. ISSN: 0040-6090
BAROCH, P., MUSIL, J., VLČEK, J., NAM, K., HAN, J. Reactive magnetron sputtering of TiOx films. Surface and Coatings Technology, 2005, roč. 193, č. 1–3, s. 107–111. ISSN: 0257-8972
MUSIL, J., BAROCH, P. Discharge in dual magnetron sputtering system. IEEE Transactions on Plasma Science, 2005, roč. 33, č. 2, s. 338–339. ISSN: 0093-3813
MARTAN, J., SEMMAR, N., LEBORGNE, C., MENN, E., MATHIAS, J. Thermal properties characterization of conductive thin films and surfaces by pulsed lasers. Applied Surface Science, 2005, roč. 247, s. 57–63. ISSN: 0169-4332
MUSIL, J., DOHNAL, P., ZEMAN, P. Physical properties and high-temperature oxidation resistance of sputtered Si3N4/MoNx nanocomposite coatings. Journal of Vacuum Science and Technology, 2005, roč. 23, č. 4, s. 1568–1575. ISSN: 0734-2101
FIALA, J., MENTL, V., KOLEGA, M., NĚMEČEK, S., KOLARIK, V., FIETZEK, H., JUES-LORENZO, M., ROL, L., ARMESTO, J. . M., CALDERÓN, G., JIMENEZ, J. . M., HNILICA, F., BĚLOVSKÝ, L., GIMÉNEZ, A., RAZA, S., ASCUE, J., MARCELLES, I. Sledování degradace energetických zařízení pomocí RTG difrakce. Materials Structure in Chemistry, Physics, Biology and Technology, 2005, roč. 12, č. 2, s. 68–73. ISSN: 1211-5894
JUNG, M., CHUNG, Y., HOUŠKA, J., BAROCH, P., VLČEK, J., MUSIL, J., NAM, K., HAN, J. A study on the energy distribution for grid-assisting magnetron sputtering. Surface and Coatings Technology, 2005, roč. 200, č. 1–4, s. 421–424. ISSN: 0257-8972
VLČEK, J., POTOCKÝ, Š., ČÍŽEK, J., HOUŠKA, J., KORMUNDA, M., ZEMAN, P. Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance. Journal of Vacuum Science and Technology A, 2005, roč. 23, č. 6, s. 1513–1522. ISSN: 0734-2101
HOUŠKA, J., BILEK, M., WARSCHKOV, O., MCKENZIE, D., VLČEK, J. Ab initio simulations of nitrogen evolution in quenched CNx and SiBCN amorphous materials. Physical Review B, 2005, roč. 72, č. 5, s. 1–6. ISSN: 1098-0121
MUSIL, J. Nanocomposite coatings with enhanced hardness. Acta Metallurgica Sinica, 2005, roč. 18, č. 3, s. 433–442. ISSN: 1006-7191
FIALA, J., KOLEGA, M. Application of Two-Dimensional Detectors in X-ray Diffraction Materials Structure Analysis. Particle and Particle Systems Characterization, 2005, roč. 22, č. 6, s. 397–400. ISSN: 0934-0866
FIALA, J., KOLEGA, M., MEDLÍN, R. Fokusace v RTG difrakční topografii polykrystalických materiálů. Materials Structure in Chemistry, Physics, Biology and Technology, 2005, roč. 12, č. 2, s. 74–76. ISSN: 1211-5894
MUSIL, J., ŠŮNA, J. The role of energy in formation of sputtered nanocomposite films. Materials Science Forum, 2005, roč. 502, s. 291–296. ISSN: 0255-5476
Y.M. Kim, Y.M. Chung, M.J. Jung, J. Vlček, J. Musil, J.G. Han, Optical emission spectra and ion energy distribution functions in TiN deposition process by reactive pulsed magnetron sputtering, Surf. Coatings Technol. 200 (2005) 835–840.
C.K. Jung, I.S. Bae, Y.H. Song, T.K. Kim, J. Vlcek, J. Musil, J.H. Boo, Synthesis of TiO2 photocatalyst and study on their improvement technology of photocatalytic activity, Surf. Coatings Technol. 200 (2005) 534–538.
2004
MUSIL, J., POLÁKOVÁ, H., ŠŮNA, J., VLČEK, J. Effect of ion bombardment on properties of hard reactively sputtered Ti(Fe)Nx films. Surface and Coatings Technology, 2004, s. 289–298. ISSN: 0257-8972
JEDRZEJOWSKI, P., ČÍŽEK, J., AMASSIAN, A., KLEMBERG-SAPIEHA, J., VLČEK, J., MARTINŮ, L. Mechanical and optical properties of hard SiCN coatings prepared by PECVD. Thin Solid Films, 2004, s. 201–207. ISSN: 0040-6090
VLČEK, J., PAJDAROVÁ, A., MUSIL, J. Pulsed dc mangetron discharges and their utilization in plasma surface engineering. Contributions to Plasma Physics, 2004, roč. 44, č. 5–6, s. 426–436. ISSN: 0863-1042
ZEMAN, H., MUSIL, J., ZEMAN, P. Physical and mechanical properties of sputtered Ta–Si–N films with a high content of Si. Journal of Vacuum Science and Technology A, 2004, roč. 22, č. 3, s. 646–649. ISSN: 0734-2101
2003
VLČEK, J., KORMUNDA, M., ČÍŽEK, J., SOUKUP, Z., PEŘINA, V., ZEMEK, J. Reactive magnetron sputtering of Si–C–N films with controlled mechanical and optical properties. Diamond and Related Materials, 2003, roč. 12, s. 1287–1294. ISSN: 0925-9635
MUSIL, J., DANIEL, R. Structure and mechanical properties of magnetron sputtered Zr–Ti–Cu–N films. SURFACE & COATINGS TECHNOLOGY, 2003, roč. 2003, s. 243–253.
MAYRHOFER, P., MITTERER, C., MUSIL, J. Structure-property relationships in single and dual-phase nanocrystalline hard coatings. Surface and Coatings Technology, 2003, s. 725–731. ISSN: 0257-9872
KUNC, F., MUSIL, J., MAYRHOFER, P., MITTERER, C. Low-stress superhard Ti–B prepared by magnetron sputtering. Surface and Coatings Technology, 2003, s. 744–753. ISSN: 0257-8972
MUSIL, J., STÁDNÍK, T., ČERŇANSKÝ, M. Superhard Mo–Al–N films composed of grains with different crystallographic orientations and/or lattice structures. Journal Korean Institute Surface Engineering, 2003, roč. 36, č. 1, s. 22–26.
POLÁKOVÁ, H., MUSIL, J., VLČEK, J., ALAART, J., MITTERER, C. Structure-hardness relations in sputtered Ti–Al–V–N films. Thin Solid Films, 2003, roč. 444, s. 189–198. ISSN: 0040-6090
MUSIL, J., ZEMAN, H., KUNC, F., VLČEK, J. Measurement of hardness of superhard films by microindentation. Materials Science and Engineering A, 2003, č. Č. 340, s. 281–285. ISSN: 0921-5093
ZEMAN, H., MUSIL, J., VLČEK, J., MAYRHOFER, P., MITTERER, C. Thermal annealing of sputtered Al–Si–Cu–N films. Vacuum, 2003, roč. 72, s. 21–28. ISSN: 0042-207X
I. Shimizu, Y. Setsuhara, S. Miyake, J. Musil, H. Saitou, M. Kumagai, Tribological Property of CeO2 Films Prepared by Ion-Beam-Assisted Deposition, Jpn. J. Appl. Phys. 42 (2003) 634–639.
P. Šmíd, E.B.M. Steers, Z. Weiss, J. Vlček, The effect of nitrogen on analytical glow discharges studied by high resolution Fourier transform spectroscopy, J. Anal. At. Spectrom. 18 (2003) 549–556.
2002
MUSIL, J., VLČEK, J., ZEMAN, P., SETSUHARA, Y., MIYAKE, S. Morphology and Microstructure of Hard and Superhard Zr–Cu–N Nanocomposite Coatings. Japanese Journal of Applied Physics, 2002, roč. 41, č. 11A, s. 6529–6533. ISSN: 0021-4922
VLČEK, J., KORMUNDA, M., ČÍŽEK, J., PEŘINA, V., ZEMEK, J. Influence of nitrogen-argon gas mixtures on reactive magnetron sputtering of hard Si–C–N films. Surface and Coatings Technology, 2002, roč. 160, č. 1, s. 74–81. ISSN: 0257-8972
MUSIL, J., VLČEK, J., REGENT, F., KUNC, F., ZEMAN, H. Hard Nanocomposite Coatings Prepared by Magnetron Sputtering. Key Engineering Materials, 2002, s. 613–622. ISSN: 1013-9826
MUSIL, J., ZEMAN, H., KASL, J. Relationship between structure and mechanical properties in hard Al–Si–Cu–N films prepared by magnetron sputtering. Thin Solid Films, 2002, roč. 413, č. 1–2, s. 121–130. ISSN: 0040-6090
SHAGINYAN, L., MIŠINA, M., ZEMEK, J., MUSIL, J., REGENT, F., BRITUN, V. Composition, structure, microhardness and residual stress of W–Ti–N films deposited by reactive magnetron sputtering. Thin Solid Films, 2002, roč. 408, č. 1–2, s. 136–147. ISSN: 0040-6090
CHOUKOUROV, A., PIHOSH, Y., STELMASHUK, V., BIEDERMAN, H., SLAVÍNSKÁ, D., KORMUNDA, M., ZAJÍČKOVÁ, L. Rf sputtering of composite SiOx/plasma polymer films and their basic properties. Surface Coatings and Technology, 2002, s. 214–217. ISSN: 0257-8972
MUSIL, J., KUNC, F., ZEMAN, H., POLÁKOVÁ, H. Relationship between hardness, Young's modulus and elastic recovery in hard nanocomposite coatings. Surface and Coatings Technology, 2002, roč. 154, s. 304–313. ISSN: 0257-8972
RŮŽIČKA, M., VLČEK, J., MUSIL, J. Effective nitriding of steels outside low-pressure microwave discharges . Surface and Coatings Technology, 2002, roč. 156, č. 1–3, s. 182–184. ISSN: 0257-8972
C. Louro, A. Cavaleiro, S. Dub, P. Smid, J. Musil, J. Vlcek, The depth profile analysis of W–Si–N coatings after thermal annealing, Surf. Coatings Technol. 161 (2002) 111–119.
P.H. Mayrhofer, F. Kunc, J. Musil, C. Mitterer, A comparative study on reactive and non-reactive unbalanced magnetron sputter deposition of TiN coatings, Thin Solid Films. 415 (2002) 151–159.
2001
J. Musil, P. Baroch, H. Poláková, J. Vlček, K.H. Nam, J.G. Han, Magnetron with gas injection through hollow cathodes machined in sputtered target, Surf. Coatings Technol. 148 (2001) 296–304. doi:10.1016/S0257-8972(01)01335-4.
J. Musil, H. Hrubý, P. Zeman, H. Zeman, R. Čerstvý, P.H. Mayrhofer, C. Mitterer, Hard and superhard nanocomposite Al–Cu–N films prepared by magnetron sputtering, Surf. Coatings Technol. 142–144 (2001) 603–609. doi:10.1016/S0257-8972(01)01200-2.
J. Musil, P. Karvánková, J. Kasl, Hard and superhard Zr–Ni–N nanocomposite films, Surf. Coatings Technol. 139 (2001) 101–109. doi:10.1016/S0257-8972(01)00989-6.
J. Musil, J. Leština, J. Vlček, T. Tölg, Pulsed dc magnetron discharge for high-rate sputtering of thin films, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 19 (2001) 420–424. doi:10.1116/1.1339018.
J. Musil, J. Vlček, Magnetron sputtering of hard nanocomposite coatings and their properties, Surf. Coatings Technol. 142–144 (2001) 557–566. doi:10.1016/S0257-8972(01)01139-2.
H. Poláková, R. Čerstvý, M. Kubásek, Control of structure in magnetron sputtered thin films, Surf. Coatings Technol. (2001) 201–205.
F. Regent, J. Musil, Magnetron sputtered Cr–Ni–N and Ti–Mo–N films: Comparison of mechanical properties, Surf. Coatings Technol. 142–144 (2001) 146–151. doi:10.1016/S0257-8972(01)01250-6.
J.S. Yoon, H.Y. Lee, J.G. Han, S.H. Yang, J. Musil, The effect of Al composition on the microstructure and mechanical properties of WC–TiAlN superhard composite coating, Surf. Coatings Technol. 142144 (2001) 596602.
2000
D. Hovorka, J. Musil, Microwave Plasma Nitriding of a Low-Alloy Steel, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 18 (2000) 2715. doi:10.1116/1.1308587.
J. Musil, Hard and superhard nanocomposite coatings, Surf. Coatings Technol. 125 (2000) 322–330. doi:10.1016/S0257-8972(99)00586-1.
J. Musil, H. Hrubý, Superhard nanocomposite Ti1-xAlxN films prepared by magnetron sputtering, Thin Solid Films. 365 (2000) 104–109.
J. Musil, M. Mišina, Low pressure radio frequency and microwave discharges for d.c. sputtering of ferromagnetic materials, Czechoslov. J. Phys. 50 (2000) 785–794. doi:10.1023/A:1022843120960.
J. Musil, J. Vlček, M. Růžička, Recent progress in plasma nitriding, Vacuum. 59 (2000) 940–951. doi:10.1016/S0042-207X(00)00404-8.
J. Musil, H. Poláková, Hard nanocomposite Zr–Y–N coatings, correlation between hardness and structure, Surf. Coatings Technol. 127 (2000) 99–106. doi:10.1016/S0257-8972(00)00560-0.
Z. Soukup, J. Lhotka, J. Musil, D. Rafaja, Effect of Ti interlayer and bias on structure and properties of TiN films, Czechoslov. J. Phys. 50 (2000) 655–663. doi:10.1023/A:1022814503252.
J. Vlček, K. Rusňák, V. Hájek, L. Martinu, New approach to understanding the reactive magnetron sputtering of hard carbon nitride films, Diam. Relat. Mater. 9 (2000) 582–586. doi:10.1016/S0925-9635(99)00350-7.
J.S. Yoon, H.S. Myung, J.G. Han, J. Musil, A study on the synthesis and microstructure of WCTiN superlattice coating, Surf. Coatings Technol. 131 (2000) 372–377.
. Zeman, P.H. Mayrhofer, C. Mitterer, J. Musil, Structure and properties of hard and superhard Zr–Cu–N nanocomposite coatings, Mater. Sci. Eng. A. 289 (2000) 189–197.
1999
M. Benda, J. Musil, Plasma nitriding enhanced by hollow cathode discharge - a new method for formation of superhard nanocomposite coatings on steel surfaces, Vacuum. 55 (1999) 171–175.
V. Hájek, K. Rusňák, J. Vlček, L. Martinu, S.C. Gujrathi, Influence of substrate bias voltage on the properties of CNx films prepared by reactive magnetron sputtering, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 17 (1999) 899. doi:10.1116/1.581662.
C. Mitterer, P.H. Mayrhofer, M. Beschliesser, P. Losbichler, P. Warbichler, F. Hofer, P.N. Gibson, W. Gissler, H. Hruby, J. Musil, J. Vlček, Microstructure and properties of nanocomposite Ti–B–N and Ti–B–C coatings, Surf. Coatings Technol. 120–121 (1999) 405–411. doi:10.1016/S0257-8972(99)00489-2.
J. Musil, Rectangular magnetron with full target erosion, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 17 (1999) 555. doi:10.1116/1.581618.
J. Musil, H. Jankovcová, V. Cibulka, Formation of Ti1–xSix and Ti1–xSixN films by magnetron co-sputtering, Czechoslov. J. Phys. 49 (1999) 359–372. doi:10.1023/A:1022853101763.
J. Musil, J. Vlček, A perspective of magnetron sputtering in surface engineering, Surf. Coatings Technol. 112 (1999) 162–169. doi:10.1016/S0257-8972(98)00748-8.
J. Musil, J. Vlček, Magnetron sputtering of alloy and alloy-based films, Thin Solid Films. 343–344 (1999) 47–50.
J. Musil, P. Zeman, Structure and microhardness of magnetron sputtered ZrCu and ZrCu–N films, Vacuum. 52 (1999) 269–275. doi:10.1016/S0042-207X(98)00297-8.
J. Musil, P. Zeman, H. Hrubý, P.H. Mayrhofer, ZrN/Cu nanocomposite film—a novel superhard material, Surf. Coatings Technol. 120–121 (1999) 179–183. doi:10.1016/S0257-8972(99)00482-X.
J. Musil, I. Leipner, M. Kolega, Nanocrystalline and nanocomposite CrCu and CrCu–N films prepared by magnetron sputtering, Surf. Coatings Technol. 115 (1999) 32–37.
P. Špatenka, J. Vlček, J. Blažek, Langmuir probe measurements of plasma parameters in a planar magnetron with additional plasma confinement, Vacuum. 55 (1999) 165–170.
J. Vlček, K. Rusňák, V. Hájek, L. Martinu, Reactive magnetron sputtering of CNx films : Ion bombardment effects and process characterization using optical emission spectroscopy, J. Appl. Phys. 86 (1999) 3646–3654.
M. Yamashita, Y. Setsuhara, S. Miyake, M. Kumagai, T. Shoji, J. Musill, Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization Related content Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna, Jpn. J. Appl. Phys. 38 (1999) 4291–4295.
1998
. Bogaerts, R. Gijbels, J. Vlček, Modeling of glow discharge optical emission spectrometry: Calculation of the argon atomic optical emission spectrum, Spectrochim. Acta, Part B At. Spectrosc. 53 (1998) 1517–1526. doi:10.1016/S0584-8547(98)00139-6.
A. Bogaerts, R. Gijbels, J. Vlček, Collisional-radiative model for an argon glow discharge, J. Appl. Phys. 84 (1998) 121–136. doi:10.1063/1.368009.
M. Mišina, J. Musil, S. Kadlec, Composite TiN–Ni thin films deposited by reactive magnetron sputter ion-plating, Surf. Coatings Technol. 110 (1998) 168–172. doi:10.1016/S0257-8972(98)00688-4.
J. Musil, Low-pressure magnetron sputtering, Vacuum. 50 (1998) 363–372.
J. Musil, Recent advances in magnetron sputtering technology, Surf. Coatings Technol. 100–101 (1998) 280–286.
J. Musil, D. Hovorka, M. Mišina, A.J. Bell, V. Studnička, Nanocrystalline titanium carbide thin films deposited by reactive magnetron sputtering, Czechoslov. J. Phys. 48 (1998) 963–971. doi:10.1023/A:1022881307331.
J. Musil, V. Ježek, Phase transformation in sputtered Ti – SS alloy film during plasma nitriding, Thin Solid Films. (1998) 458–462.
J. Musil, F. Regent, Formation of nanocrystalline NiCr–N films by reactive dc magnetron sputtering, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 16 (1998) 3301–3304. doi:10.1116/1.581537.
J. Musil, J. Vlček, Magnetron sputtering of alloy-based films and its specifity, Czechoslov. J. Phys. 48 (1998) 1209–1224. doi:10.1023/A:1022814319240.
J. Musil, J. Vlček, Magnetron sputtering of films with controlled texture and grain size, Mater. Chem. Phys. 54 (1998) 116–122.
J. Vlček, J. Musil, L. Forejt, Fundamentals of elementary processes in plasmas, Surf. Coatings Technol. 98 (1998) 1557–1564. doi:10.1016/S0257-8972(97)00283-1.
1997
M. Benda, J. Vlček, V. Cibulka, J. Musil, Plasma nitriding combined with a hollow cathode discharge sputtering at high pressures, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 15 (1997) 2636. doi:10.1116/1.580935.
V. Hájek, K. Rusňák, J. Vlček, L. Martinu, H.M. Hawthorne, Tribological study of CNx films prepared by reactive dc magnetron sputtering, Wear. 213 (1997) 80–89. doi:10.1016/S0043-1648(97)00176-2.
J. Musil, M. Mišina, D. Hovorka, Planar magnetron sputtering discharge enhanced with radio frequency or microwave magnetoactive plasma, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 15 (1997) 1999–2006. doi:10.1116/1.580670.
P. Špatenka, I. Leipner, J. Vlček, J. Musil, A comparison of internal plasma parameters in a conventional planar magnetron and a magnetron with additional plasma confinement, Plasma Sources Sci. Technol. 6 (1997) 46–52. doi:10.1088/0963-0252/6/1/007.
J. Vlček, Magnesium as a representative analyte metal in argon inductively coupled plasmas. I. An extensive collisional-radiative model, Spectrochim. Acta - Part B At. Spectrosc. 52 (1997) 599–608. doi:10.1016/S0584-8547(96)01636-9.
J. Vlček, L. Forejt, J.A.M. Van Der Mullen, Magnesium as a representative analyte metal in argon inductively coupled plasmas. II. Population mechanisms in analytical zones of different spectrochemical systems, Spectrochim. Acta - Part B At. Spectrosc. 52 (1997) 609–619. doi:10.1016/S0584-8547(96)01636-9.
1996
J. Musil, A.J. Bell, J. Vlček, T. Hurkmans, Formation of high temperature phases in sputter deposited Ti-based films below 100 °C, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 14 (1996) 2247–2250. doi:10.1116/1.580055.
J. Musil, J. Vlček, V. Ježek, M. Benda, M. Kubásek, L. Soukup, Interdiffusion between Ti and steel elements in Ti coating / steel substrate couple plasma, Vacuum. 47 (1996) 871–877.
Z. Weiss, J. Musil, J. Vlček, Depth profile analysis of minor elements by GD-OES: Applications to diffusion phenomena, Fresenius. J. Anal. Chem. 354 (1996) 188–192. doi:10.1007/PL00012709.
1995
M. Benda, J. Vlček, J. Musil, Anodic plasma nitriding with a molybdenum cathode, Vacuum. 46 (1995) 43–47. doi:10.1016/0042-207X(93)E0006-7.
J. Musil, K. Rusňák, V. Ježek, J. Vlček, Planar magnetron with additional plasma confinement, Vacuum. 46 (1995) 341–347. doi:10.1016/0042-207X(94)00076-X.
J. Musil, J. Vlček, V. Ježek, M. Benda, Protection of aluminium by duplex coatings, Surf. Coatings Technol. 76–77 (1995) 341–347.
J. Musil, J. Vlček, V. Ježek, M. Benda, M. Kolega, R. Boomsma, Production of Ti films with controlled texture, Surf. Coatings Technol. 76–77 (1995) 274–279.
J. Musil, J. Vlček, V. Ježek, M. Benda, Z. Weiss, Mutual interdiffusion of elements in steel and Ti coating and aluminium and Ti coating couples during plasma nitriding, Surf. Coatings Technol. 74–75 (1995) 609–613. doi:10.1016/0257-8972(95)08353-7.
1994
J. Musil, J. Matouš, J. Vlček, L. Koydl, K. Müller, Surface morphology of sputter deposited low melting point metallic thin films, Czechoslov. J. Phys. 44 (1994) 565–574. doi:10.1007/BF01689604.
1993
J. Musil, J. Vlček, V. Ježek, M. Kubásek, R. Čerstvý, T. Tölg, M. Benda, M. Kolega, J. Musil, Plasma nitriding of sputtered Ti films, Mater. Sci. Eng. A. 163 (1993) 181–186. doi:10.1016/0921-5093(93)90786-E.
K. Rusňák, J. Vlček, Emission spectroscopy of the plasma in the cathode region of N2 – H2 abnormal glow discharges for steel surface nitriding, J. Phys. D. Appl. Phys. 26 (1993) 585–589. doi:10.1088/0022-3727/26/4/010.
1992
J. Vlček, Comment on twho new ollisional-radiative models for and argon plasma, J. Quant. Spectrosc. Radiat. Transf. 47 (1992) 431–432.
J. Vlček, V. Pelikán, Collisional-radiative ionization and recombination in an inductively coupled argon plasma, Spectrochim. Acta Part B At. Spectrosc. 47 (1992) 681–688. doi:10.1016/0584-8547(92)80062-L.
1991
J. Vlček, V. Pelikán, A collisional-radiative model applicable to argon discharges over a wide range of conditions. IV: Application to inductively coupled plasmas, J. Phys. D. Appl. Phys. 24 (1991) 309–317.
1990
J. Vlček, V. Pelikán, A collisional-radiative model applicable to argon discharges over a wide range of conditions. III. Application to atmospheric and subatmospheric pressure arcs, J. Phys. D. Appl. Phys. 23 (1990) 526–532. doi:10.1088/0022-3727/23/5/010.
1989
J. Vlček, A collisional-radiative model applicable to argon discharges over a wide range of conditions. I: Formulation and basic data, J. Phys. D. Appl. Phys. 22 (1989) 623–631.
J. Vlček, V. Pelikán, A collisional-radiative model applicable to argon discharges over a wide range of conditions. II: Application to low-pressure, holow-cathode arc and low-pressure glow discharges, J. Phys. D. Appl. Phys. 22 (1989) 632–643.
1986
J. Vlček, V. Pelikán, Excited level populations of argon atoms in a non-isothermal plasma, J. Phys. D. Appl. Phys. 19 (1986) 1879–1888. doi:10.1088/0022-3727/19/10/012.
1985
J. Vlček, V. Pelikán, Electron energy distribution function in the collisional- radiative model of an argon plasma, J. Phys. D. Appl. Phys. 18 (1985) 347–358. doi:10.1088/0022-3727/18/3/005.
1984
J. Vlček, J. Ferdinand, Collisional-Radiative Recombination in Argon Plasmas, Beitr. Plasmaphys. 24 (1984) 19–26.
1982
J. Jerhot, J. Vlček, Seebeck effect in polycrystalline semiconductors, Thin Solid Films. 92 (1982) 259–271. doi:10.1016/0040-6090(82)90008-6.
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Název |
Počet publikací |
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Surface and Coatings Technology |
87 |
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Thin Solid Films |
35 |
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Journal of Vacuum Science and Technology A |
28 |
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Applied Surface Science |
17 |
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Journal of Applied Physics |
17 |
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Plasma Processes and Polymers |
10 |
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Plasma Sources Science and Technology |
13 |
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Vacuum |
24 |
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Journal of Physics D: Applied Physics |
18 |
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Journal of Physics: Condensed matter |
4 |
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IEEE Transactions on Plasma Science |
3 |
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Diamond and Related Materials |
4 |
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Thermochimica Acta |
2 |
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Physical Review B |
3 |
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Europhysics Letters |
2 |
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Zeitschrift für Kristallographie |
2 |
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Nanoscale Research Letters |
2 |
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Review of Scientific Instruments |
2 |
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Japanese Journal of Applied Physics |
5 |
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Acta Materialia |
4 |
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Ceramics International |
8 |
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Acta Crystallographica A |
2 |
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Materials Science and Engineering A |
3 |
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Contributions to Plasma Physics |
1 |
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J. of Photochem. and Photobiology A: Chem. |
1 |
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Journal of Materials Science |
1 |
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Journal of Thermal Spray Technology |
1 |
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International Journal of Thermophysics |
1 |
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Nanoscale and Microscale Thermophys. Eng. |
1 |
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Particle and Particle Systems Characterization |
1 |
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Sensors and Actuators B: Chemical |
1 |
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Advances in Applied Ceramics |
1 |
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Journal of the American Ceramic Society |
1 |
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Computational Materials Science |
4 |
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RSC Advances |
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1 |
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7 |
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2 |
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Spectrochimica Acta Part B: Atomic Spectroscopy |
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